Publication:

Photoresist coating and patterning for through-silicon via technology

Date

2008
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorPham, Nga
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorRuythooren, Wouter
dc.contributor.authorDe Moor, Piet
dc.contributor.authorMajeed, Bivragh
dc.contributor.authorBaert, Kris
dc.contributor.authorSwinnen, Bart
dc.contributor.imecauthorPham, Nga
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorRuythooren, Wouter
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorMajeed, Bivragh
dc.contributor.imecauthorSwinnen, Bart
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.date.accessioned2021-10-17T09:50:09Z
dc.date.available2021-10-17T09:50:09Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.issn0960-1317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14312
dc.identifier.urlhttp://iopscience.iop.org/9060-1317/18/12/125008
dc.source.beginpage125008
dc.source.issue12
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.volume18
dc.title

Photoresist coating and patterning for through-silicon via technology

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
17257.pdf
Size:
1.25 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles