Mask innovations on the eve of high NA EUV lithography

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Author(s)

Philipsen, Vicky

;

Frommhold, Andreas

;

Thakare, Devesh

;

Libeert, Guillaume

;

;

Franke, Joern-Holger

;

;

Van Look, Lieve

;

;

De Bisschop, Peter

;

Jonckheere, Rik

;

Kovalevich, Tatiana

;

;

Hendrickx, Eric

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS

Metrics

106 since deposited on 2024-04-25

Acq. date: 2025-10-25