Mask innovations on the eve of high NA EUV lithography

Philipsen, Vicky; Frommhold, Andreas; Thakare, Devesh; Libeert, Guillaume; Lee, Inhwan; Franke, Joern-Holger; Bekaert, Joost; Van Look, Lieve; Pellens, Nick; De Bisschop, Peter; Jonckheere, Rik; Kovalevich, Tatiana; Wiaux, Vincent; Hendrickx, Eric

doi:10.35848/1347-4065/ad38c7

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Mask innovations on the eve of high NA EUV lithography

Date

2024

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https://doi.org/10.35848/1347-4065/ad38c7

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JAPANESE JOURNAL OF APPLIED PHYSICS

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Acq. date: 2026-01-26

Mask innovations on the eve of high NA EUV lithography

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