Publication:

Mask innovations on the eve of high NA EUV lithography

Date

2024
Journal Article Review
https://doi.org/10.35848/1347-4065/ad38c7
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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorThakare, Devesh
dc.contributor.authorLibeert, Guillaume
dc.contributor.authorLee, Inhwan
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorBekaert, Joost
dc.contributor.authorVan Look, Lieve
dc.contributor.authorPellens, Nick
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorJonckheere, Rik
dc.contributor.authorKovalevich, Tatiana
dc.contributor.authorWiaux, Vincent
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorThakare, Devesh
dc.contributor.imecauthorLibeert, Guillaume
dc.contributor.imecauthorLee, Inhwan
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPellens, Nick
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorKovalevich, Tatiana
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecThakare, Devesh::0000-0003-3265-7042
dc.contributor.orcidimecLibeert, Guillaume::0000-0003-1392-5371
dc.contributor.orcidimecLee, Inhwan::0000-0002-3283-5075
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecVan Look, Lieve::0009-0000-6198-024X
dc.contributor.orcidimecPellens, Nick::0000-0001-5527-5130
dc.contributor.orcidimecDe Bisschop, Peter::0000-0002-8297-5076
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecKovalevich, Tatiana::0000-0001-9633-8257
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2025-07-03T13:55:30Z
dc.date.available2024-04-25T17:35:00Z
dc.date.available2025-07-03T13:55:30Z
dc.date.issued2024
dc.identifier.doi10.35848/1347-4065/ad38c7
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43875
dc.publisherIOP Publishing Ltd
dc.source.beginpageArt. 040804
dc.source.endpageN/A
dc.source.issue4
dc.source.journalJAPANESE JOURNAL OF APPLIED PHYSICS
dc.source.numberofpages8
dc.source.volume63
dc.title

Mask innovations on the eve of high NA EUV lithography

dc.typeJournal article review
dspace.entity.typePublication
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