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Articles
Improvement of PECVD silicon–germanium crystallization for CMOS compatible MEMS applications
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Improvement of PECVD silicon–germanium crystallization for CMOS compatible MEMS applications
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Date
2010
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20155.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Guo, Bin
;
Severi, Simone
;
Bryce, George
;
Claes, Gert
;
Van Hoof, Rita
;
Du Bois, Bert
;
Haspeslagh, Luc
;
Witvrouw, Ann
;
Decoutere, Stefaan
Journal
Journal of the Electrochemical Society
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1881
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-10
Citations