Publication:

Improvement of PECVD silicon–germanium crystallization for CMOS compatible MEMS applications

Date

2010
Journal article
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dc.contributor.authorGuo, Bin
dc.contributor.authorSeveri, Simone
dc.contributor.authorBryce, George
dc.contributor.authorClaes, Gert
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorDu Bois, Bert
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDecoutere, Stefaan
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorBryce, George
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecHaspeslagh, Luc::0000-0003-3561-3387
dc.date.accessioned2021-10-18T16:47:06Z
dc.date.available2021-10-18T16:47:06Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17200
dc.source.beginpageD103
dc.source.endpageD106
dc.source.issue2
dc.source.journalJournal of the Electrochemical Society
dc.source.volume157
dc.title

Improvement of PECVD silicon–germanium crystallization for CMOS compatible MEMS applications

dc.typeJournal article
dspace.entity.typePublication
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