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The impact of plasma-charging damage on the RF performance of deep-submicron MOSFET
Publication:
The impact of plasma-charging damage on the RF performance of deep-submicron MOSFET
Date
2002
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pantisano, Luigi
;
Cheung, K. P.
;
Roussel, Philippe
;
Paccagnella, A.
Journal
IEEE Electron Device Letters
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1919
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-08
Citations
Metrics
Views
1919
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-08
Citations