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The impact of plasma-charging damage on the RF performance of deep-submicron MOSFET

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dc.contributor.authorPantisano, Luigi
dc.contributor.authorCheung, K. P.
dc.contributor.authorRoussel, Philippe
dc.contributor.authorPaccagnella, A.
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.accessioned2021-10-14T22:41:52Z
dc.date.available2021-10-14T22:41:52Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6692
dc.source.beginpage309
dc.source.endpage311
dc.source.issue6
dc.source.journalIEEE Electron Device Letters
dc.source.volume23
dc.title

The impact of plasma-charging damage on the RF performance of deep-submicron MOSFET

dc.typeJournal article
dspace.entity.typePublication
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