Publication:
Growth and reliability of 3nm N2O gate oxide
Date
| dc.contributor.author | Nigam, Tanya | |
| dc.contributor.author | Depas, Michel | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.date.accessioned | 2021-09-29T15:14:23Z | |
| dc.date.available | 2021-09-29T15:14:23Z | |
| dc.date.issued | 1996 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1374 | |
| dc.source.conference | 27th IEEE Semiconductor Interface Specialists Conference (SISC); December 5-7, 1996; San Diego, Calif., USA. | |
| dc.source.conferencelocation | ||
| dc.title | Growth and reliability of 3nm N2O gate oxide | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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