Damage free integration of ultralow-k dielectrics by template replacement approach

dc.contributor.author	Zhang, Liping
dc.contributor.author	de Marneffe, Jean-Francois
dc.contributor.author	Heylen, Nancy
dc.contributor.author	Murdoch, Gayle
dc.contributor.author	Tokei, Zsolt
dc.contributor.author	Boemmels, Juergen
dc.contributor.author	De Gendt, Stefan
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.imecauthor	Zhang, Liping
dc.contributor.imecauthor	de Marneffe, Jean-Francois
dc.contributor.imecauthor	Heylen, Nancy
dc.contributor.imecauthor	Murdoch, Gayle
dc.contributor.imecauthor	Tokei, Zsolt
dc.contributor.imecauthor	Boemmels, Juergen
dc.contributor.imecauthor	De Gendt, Stefan
dc.contributor.orcidimec	De Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned	2021-10-23T01:33:30Z
dc.date.available	2021-10-23T01:33:30Z
dc.date.issued	2015
dc.identifier.issn	0003-6951
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/26239
dc.identifier.url	http://scitation.aip.org/content/aip/journal/apl/107/9/10.1063/1.4930072
dc.source.beginpage	92901
dc.source.issue	2
dc.source.journal	Applied Physics Letters
dc.source.volume	107
dc.title	Damage free integration of ultralow-k dielectrics by template replacement approach
dc.type	Journal article
dspace.entity.type	Publication
Files
Publication available in collections:	Articles

Date