Publication:

Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films

Date

2000
Proceedings Paper
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dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorIacopi, Francesca
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorShamiryan, Denis
dc.contributor.authorCoenegrachts, Bart
dc.contributor.authorStruyf, Herbert
dc.contributor.authorLepage, Muriel
dc.contributor.authorMeuris, Marc
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorGray, William
dc.contributor.authorMeynen, Herman
dc.contributor.authorDe Roest, David
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-14T12:55:25Z
dc.date.available2021-10-14T12:55:25Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4345
dc.source.beginpage93
dc.source.conferenceProceedings of the IEEE 2000 International Interconnect Technology Conference
dc.source.conferencedate5/06/2000
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage95
dc.title

Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films

dc.typeProceedings paper
dspace.entity.typePublication
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