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Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity study
Publication:
Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity study
Date
2024
Journal article
https://doi.org/10.1117/1.JMM.23.4.043001
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Bel, Julie
;
Verstraete, Lander
;
Suh, Hyo Seon
;
Bezard, Philippe
;
Moussa, Alain
;
Santos, Andreia
;
Her, Youngjun
;
De Gendt, Stefan
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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116
since deposited on 2025-01-09
Acq. date: 2025-10-27
Citations
Metrics
Views
116
since deposited on 2025-01-09
Acq. date: 2025-10-27
Citations