Publication:

Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity study

Date

2024
Journal article
https://doi.org/10.1117/1.JMM.23.4.043001
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dc.contributor.authorVan Bel, Julie
dc.contributor.authorVerstraete, Lander
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorBezard, Philippe
dc.contributor.authorMoussa, Alain
dc.contributor.authorSantos, Andreia
dc.contributor.authorHer, Youngjun
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorVan Bel, Julie
dc.contributor.imecauthorVerstraete, Lander
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVan Bel, Julie::0000-0002-4287-9725
dc.contributor.orcidimecVerstraete, Lander::0000-0002-3679-811X
dc.contributor.orcidimecSuh, Hyo Seon::0000-0003-4370-5062
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2025-07-03T13:48:33Z
dc.date.available2025-01-09T17:22:32Z
dc.date.available2025-07-03T13:48:33Z
dc.date.issued2024
dc.identifier.doi10.1117/1.JMM.23.4.043001
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45054
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 043001
dc.source.endpageN/A
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages13
dc.source.volume23
dc.subject.keywordsDIMENSIONS
dc.title

Rectification of extreme ultraviolet lithography patterns by directed self-assembly: a roughness and defectivity study

dc.typeJournal article
dspace.entity.typePublication
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