Publication:
High-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry
Date
| dc.contributor.author | Boher, P. | |
| dc.contributor.author | Evrard, P. | |
| dc.contributor.author | Defranoux, C. | |
| dc.contributor.author | Darragon, A. | |
| dc.contributor.author | Sun, Lianchao | |
| dc.contributor.author | Fouere, J.C. | |
| dc.contributor.author | Stehlé, J.L. | |
| dc.contributor.author | Bellandi, E. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.date.accessioned | 2021-10-15T04:03:00Z | |
| dc.date.available | 2021-10-15T04:03:00Z | |
| dc.date.issued | 2003-12 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7239 | |
| dc.source.conference | MRS Fall Meeting Symposium E: Fundamentals of Novel Oxide/Semiconductor Interfaces | |
| dc.source.conferencedate | 1/12/2003 | |
| dc.source.conferencelocation | Boston, MA USA | |
| dc.title | High-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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