Publication:
Scalability of RuTiN barriers deposited by plasma-enhanced atomic layer deposition for advanced interconnects
Date
Loading...
Files
Journal
Abstract
Description
Metrics
Views
1832 since deposited on 2021-10-22
1last month
Acq. date: 2025-12-15
Citations
Metrics
Views
1832 since deposited on 2021-10-22
1last month
Acq. date: 2025-12-15
Citations