Publication:

Process sensitivity analysis for EPE optimization of MP18 SALELE BEOL patterning

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051089
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0009-0000-3384-8540
cris.virtualsource.department706e77ed-567b-4ab5-993a-5bd942c3f101
cris.virtualsource.department39ffd6c3-9161-4c05-9b59-66e46fdee6b8
cris.virtualsource.orcid706e77ed-567b-4ab5-993a-5bd942c3f101
cris.virtualsource.orcid39ffd6c3-9161-4c05-9b59-66e46fdee6b8
dc.contributor.authorSoussou, Assawer
dc.contributor.authorKljucar, Luka
dc.contributor.authorDusa, Mircea
dc.contributor.authorMountsier, Tom
dc.contributor.authorJurczak, Gosia
dc.contributor.authorLowe, Brett
dc.contributor.imecauthorKljucar, Luka
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecDusa, Mircea::0009-0000-3384-8540
dc.date.accessioned2025-07-28T03:57:28Z
dc.date.available2025-07-28T03:57:28Z
dc.date.issued2025
dc.description.wosFundingTextThis work was supported by 14ACMOS ECSEL Joint Undertaking.
dc.identifier.doi10.1117/12.3051089
dc.identifier.eisbn978-1-5106-8639-7
dc.identifier.isbn978-1-5106-8638-0
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45956
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1
dc.source.conference2025 Conference on Metrology Inspection and Process Control-Annual
dc.source.conferencedateFEB 24-28, 2025
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages7
dc.title

Process sensitivity analysis for EPE optimization of MP18 SALELE BEOL patterning

dc.typeProceedings paper
dspace.entity.typePublication
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