Publication:

Enhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates

Date

2014
Meeting abstract
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dc.contributor.authorSingh, Arjun
dc.contributor.authorSayan, Safak
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorChan, BT
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-22T05:54:14Z
dc.date.available2021-10-22T05:54:14Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24534
dc.source.conferenceSPIE Advanced Lithography
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Enhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates

dc.typeMeeting abstract
dspace.entity.typePublication
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