Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration

Publication:

2009

Journal article

Author(s)

;

;

;

Fenger, Germain

;

Lam, Michael

;

Christian, Zuniga

;

Habib, Mohamed

;

Diab, Hesham

;

Word, James

Journal of Micro/Nanolithography, MEMS, and MOEMS

1951 since deposited on 2021-10-18

Acq. date: 2026-01-26