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Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration

Date

2009
Journal article
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dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorHendrickx, Eric
dc.contributor.authorFenger, Germain
dc.contributor.authorLam, Michael
dc.contributor.authorChristian, Zuniga
dc.contributor.authorHabib, Mohamed
dc.contributor.authorDiab, Hesham
dc.contributor.authorWord, James
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorHendrickx, Eric
dc.date.accessioned2021-10-18T00:13:56Z
dc.date.available2021-10-18T00:13:56Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15753
dc.source.beginpage41505
dc.source.issue4
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume8
dc.title

Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration

dc.typeJournal article
dspace.entity.typePublication
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