Publication:
Mitigating EUV mask 3D effects by alternative metal absorbers
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
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| cris.virtual.orcid | 0000-0003-2516-0417 | |
| cris.virtual.orcid | 0000-0002-2959-432X | |
| cris.virtual.orcid | 0000-0003-1159-2315 | |
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| cris.virtualsource.orcid | 63f3ce0b-d9e8-400e-ac69-5fb1e181e885 | |
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| cris.virtualsource.orcid | 4a903d58-d8c2-4836-8802-dd8badca53b3 | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Luong, Vu | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.author | Erdmann, Andreas | |
| dc.contributor.author | Xu, Dongbo | |
| dc.contributor.author | Evanschitzky, Peter | |
| dc.contributor.author | van de Kruijs, Robbert | |
| dc.contributor.author | Edrisi, Arash | |
| dc.contributor.author | Scholze, Frank | |
| dc.contributor.author | Laubis, Christian | |
| dc.contributor.author | Irmscher, Mathias | |
| dc.contributor.author | Naasz, Sandra | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Luong, Vu | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2021-10-23T13:41:12Z | |
| dc.date.available | 2021-10-23T13:41:12Z | |
| dc.date.issued | 2016 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27139 | |
| dc.source.conference | International Symposium on Extreme Ultraviolet Lithography - EUVL | |
| dc.source.conferencedate | 24/10/2016 | |
| dc.source.conferencelocation | Hiroshima Japan | |
| dc.title | Mitigating EUV mask 3D effects by alternative metal absorbers | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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