Publication:

Mitigating EUV mask 3D effects by alternative metal absorbers

Date

2016
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorHendrickx, Eric
dc.contributor.authorErdmann, Andreas
dc.contributor.authorXu, Dongbo
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorvan de Kruijs, Robbert
dc.contributor.authorEdrisi, Arash
dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.contributor.authorIrmscher, Mathias
dc.contributor.authorNaasz, Sandra
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-23T13:41:12Z
dc.date.available2021-10-23T13:41:12Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27139
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
dc.title

Mitigating EUV mask 3D effects by alternative metal absorbers

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions