Publication:

Influence of passivating interlayer on Ge/HfO2 and Ge/Al2O3 interface band diagrams

Date

2008

Journal article

Simple item page Full metadata Statistics

Files

18584.pdf 393.9 KB

Author(s)

Afanasiev, Valeri

;

Stesmans, Andre

;

Delabie, Annelies

;

Bellenger, Florence

;

;

;

Merckling, Clement

;

;

;

Journal

Materials Science in Semiconductor Processing

Statistics

1824 since deposited on 2021-10-17

Acq. date: 2026-02-27