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The effect of ion implantation on the metal contamination of silicon surfaces in aqueous solution

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dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-10-14T17:16:37Z
dc.date.available2021-10-14T17:16:37Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5451
dc.source.beginpage7
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
dc.source.endpage8
dc.title

The effect of ion implantation on the metal contamination of silicon surfaces in aqueous solution

dc.typeProceedings paper
dspace.entity.typePublication
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