Publication:

Experimental Validation of Process-Induced Variability Aware SPICE Simulation Platform for Sub-20 nm FinFET Technologies

Date

2021
Journal article
https://doi.org/10.1109/TED.2021.3053185
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dc.contributor.authorRawat, Amita
dc.contributor.authorSharan, Neha
dc.contributor.authorJang, Doyoung
dc.contributor.authorChiarella, Thomas
dc.contributor.authorBufler, Fabian
dc.contributor.authorCatthoor, Francky
dc.contributor.authorParvais, Bertrand
dc.contributor.authorGanguly, Udayan
dc.contributor.imecauthorSharan, Neha
dc.contributor.imecauthorJang, Doyoung
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorBufler, Fabian
dc.contributor.imecauthorCatthoor, Francky
dc.contributor.imecauthorParvais, Bertrand
dc.contributor.orcidextRawat, Amita::0000-0003-0175-3875
dc.contributor.orcidextGanguly, Udayan::0000-0002-1498-5993
dc.contributor.orcidimecSharan, Neha::0000-0001-8412-2213
dc.contributor.orcidimecJang, Doyoung::0000-0002-5629-8294
dc.contributor.orcidimecParvais, Bertrand::0000-0003-0769-7069
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecCatthoor, Francky::0000-0002-3599-8515
dc.contributor.orcidimecBufler, Fabian::0000-0002-1558-9378
dc.date.accessioned2023-08-07T09:47:22Z
dc.date.available2023-06-20T10:38:52Z
dc.date.available2023-08-07T09:47:22Z
dc.date.embargo9999-12-31
dc.date.issued2021
dc.identifier.doi10.1109/TED.2021.3053185
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42021
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage976
dc.source.endpage980
dc.source.issue3
dc.source.journalIEEE TRANSACTIONS ON ELECTRON DEVICES
dc.source.numberofpages5
dc.source.volume68
dc.subject.keywordsWORK-FUNCTION
dc.subject.keywordsMETAL
dc.title

Experimental Validation of Process-Induced Variability Aware SPICE Simulation Platform for Sub-20 nm FinFET Technologies

dc.typeJournal article
dspace.entity.typePublication
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