Publication:

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Date

2015
Proceedings Paper
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dc.contributor.authorMa, Yuansheng
dc.contributor.authorLei, Junjiang
dc.contributor.authorTorres, J. Andres
dc.contributor.authorHong, Le
dc.contributor.authorWord, James
dc.contributor.authorFenger, Germain
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorLippincott, George
dc.contributor.authorGupta, Rachit
dc.contributor.authorLafferty, Neal
dc.contributor.authorHe, Yuan
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-22T20:45:26Z
dc.date.available2021-10-22T20:45:26Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25588
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210731
dc.source.beginpage942306
dc.source.conferenceAlternative Lithographic Technologies VII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

dc.typeProceedings paper
dspace.entity.typePublication
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