Publication:
Massive metrology of 2D logic patterns on BEOL EUVL
Date
| dc.contributor.author | Das, Sayantan | |
| dc.contributor.author | Kang, S. | |
| dc.contributor.author | Halder, Sandip | |
| dc.contributor.author | Maruyama, K. | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Yamazaki, Y. | |
| dc.contributor.imecauthor | Das, Sayantan | |
| dc.contributor.imecauthor | Halder, Sandip | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
| dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
| dc.date.accessioned | 2021-10-28T20:55:34Z | |
| dc.date.available | 2021-10-28T20:55:34Z | |
| dc.date.issued | 2020 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/34953 | |
| dc.identifier.url | https://doi.org/10.1117/12.2554543 | |
| dc.source.beginpage | 113250J | |
| dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXXIV | |
| dc.source.conferencedate | 23/03/2020 | |
| dc.source.conferencelocation | San Jose,CA USA | |
| dc.title | Massive metrology of 2D logic patterns on BEOL EUVL | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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