Reliability of ultra-thin gate oxide below 3 nm in the direct tunneling regime

Publication:

1997

Journal article

Author(s)

;

;

;

;

Japanese Journal of Applied Physics. Part 1

2 since deposited on 2021-09-30

Acq. date: 2026-04-05

1914 since deposited on 2021-09-30

2last month

Acq. date: 2026-04-05