Reliability of ultra-thin gate oxide below 3 nm in the direct tunneling regime

Publication:

1997

Journal article

Author(s)

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Japanese Journal of Applied Physics. Part 1

2 since deposited on 2021-09-30

Acq. date: 2026-02-24

1912 since deposited on 2021-09-30

Acq. date: 2026-02-24