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Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle
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Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle
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Date
2020
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vincent, Benjamin
;
Hathwar, R.
;
Kamon, M.
;
Ervin, J.
;
Schram, Tom
;
Chiarella, Thomas
;
Demuynck, Steven
;
Baudot, Sylvain
;
Siew, Yong Kong
;
Kubicek, Stefan
;
Dentoni Litta, Eugenio
;
Chew, Soon Aik
;
Mitard, Jerome
Journal
IEEE Transactions on Electron Devices
Abstract
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1966
since deposited on 2021-10-29
1
last month
Acq. date: 2025-12-11
Citations
Metrics
Views
1966
since deposited on 2021-10-29
1
last month
Acq. date: 2025-12-11
Citations