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Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle

Date

2020
Journal article
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dc.contributor.authorVincent, Benjamin
dc.contributor.authorHathwar, R.
dc.contributor.authorKamon, M.
dc.contributor.authorErvin, J.
dc.contributor.authorSchram, Tom
dc.contributor.authorChiarella, Thomas
dc.contributor.authorDemuynck, Steven
dc.contributor.authorBaudot, Sylvain
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorChew, Soon Aik
dc.contributor.authorMitard, Jerome
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorBaudot, Sylvain
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorChew, Soon Aik
dc.contributor.imecauthorMitard, Jerome
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecChew, Soon Aik::0000-0003-3013-4846
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.date.accessioned2021-10-29T07:29:49Z
dc.date.available2021-10-29T07:29:49Z
dc.date.issued2020
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36274
dc.identifier.urlhttps://ieeexplore.ieee.org/document/9222056
dc.source.beginpage5374
dc.source.endpage5380
dc.source.issue12
dc.source.journalIEEE Transactions on Electron Devices
dc.source.volume67
dc.title

Process variation analysis of device performance using virtual fabrication: methodology demonstrated on a CMOS 14-nm FinFET vehicle

dc.typeJournal article
dspace.entity.typePublication
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