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Ru CMP for advanced metallization

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dc.contributor.authorTeugels, Lieve
dc.contributor.authorHeylen, Nancy
dc.contributor.authorRidremont, Romain
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorYamanaka, Tatsuya
dc.contributor.authorYamada, Yuuya
dc.contributor.authorNishimura, Kouhei
dc.contributor.authorBuch, Xavier
dc.contributor.authorHiro, Akito
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorStruyf, Herbert
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorRidremont, Romain
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorHiro, Akito
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.date.accessioned2021-10-27T19:32:56Z
dc.date.available2021-10-27T19:32:56Z
dc.date.issued2019-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34113
dc.source.conferenceInternational Conference on Planarization/CMP Technology 2019
dc.source.conferencedate15/09/2019
dc.source.conferencelocationHsinchu Taiwan
dc.title

Ru CMP for advanced metallization

dc.typeProceedings paper
dspace.entity.typePublication
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