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Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM
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1957 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-09
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Metrics
Views
1957 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-09
Citations