Publication:

Integration issues in step and repeat UV nanoimprint lithography

Date

2008
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dc.contributor.authorCharpin-Nicolle, C.
dc.contributor.authorChiaroni, J.
dc.contributor.authorLe Cunff, Y.
dc.contributor.authorDenis, H.
dc.contributor.authorRochat, N.
dc.contributor.authorVillani, M. L.
dc.contributor.authorMassin, J.
dc.contributor.authorIrmscher, M.
dc.contributor.authorVratzov, B.
dc.contributor.authorvan Hossen, H.
dc.contributor.authorGubbini, P.
dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.date.accessioned2021-10-17T06:29:19Z
dc.date.available2021-10-17T06:29:19Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13500
dc.source.conference34th International Conference on Micro and Nano Engineering
dc.source.conferencedate15/09/2008
dc.source.conferencelocationAthens Greece
dc.title

Integration issues in step and repeat UV nanoimprint lithography

dc.typeOral presentation
dspace.entity.typePublication
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