Publication:

Integrated fab process for metal oxide EUV photoresist

Date

2015
Proceedings Paper
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33316.pdf 3.09 MB

Author(s)

Grenville, Andrew
;
Anderson, Jeremy T.
;
Clark, Benjamin L.
;
De Schepper, Peter  
;
Edson, Joseph
;
Greer, Michael  
;
Kai, Jiang
;
Kocsis, Michael  
;
Meyers, Stephen T.
;
Stowers, Jason K.
;
Telecky, Alan J.
;
De Simone, Danilo  
;
Vandenberghe, Geert  

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2112 since deposited on 2021-10-22
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2112 since deposited on 2021-10-22
Acq. date: 2026-09-28

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