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A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final steps
Publication:
A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final steps
Date
1995
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gomes dos Santos Filho, S.
;
Hasenack, Claus
;
Salay, L. C.
;
Mertens, Paul
Journal
J. Electrochem. Soc.
Abstract
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2030
since deposited on 2021-09-29
Acq. date: 2025-10-30
Citations
Metrics
Views
2030
since deposited on 2021-09-29
Acq. date: 2025-10-30
Citations