Publication:
A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final steps
Date
| dc.contributor.author | Gomes dos Santos Filho, S. | |
| dc.contributor.author | Hasenack, Claus | |
| dc.contributor.author | Salay, L. C. | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-09-29T13:06:47Z | |
| dc.date.available | 2021-09-29T13:06:47Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/660 | |
| dc.source.beginpage | 902 | |
| dc.source.endpage | 907 | |
| dc.source.journal | J. Electrochem. Soc. | |
| dc.source.volume | 142 | |
| dc.title | A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final steps | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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