Publication:

Sequential 3D standard cell 4T architecture using design crenellation and self-aligned MOL for N2 technology and beyond

Date

2020
Proceedings Paper
https://doi.org/10.1117/12.2552032
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dc.contributor.authorWeckx, Pieter
dc.contributor.authorChehab, Bilal
dc.contributor.authorRyckaert, Julien
dc.contributor.authorVerkest, Diederik
dc.contributor.authorSpessot, Alessio
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorChehab, Bilal
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.orcidimecSpessot, Alessio::0000-0003-2381-0121
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.date.accessioned2023-08-09T09:13:05Z
dc.date.available2023-08-09T09:13:05Z
dc.date.embargo2020-12-31
dc.date.issued2020
dc.identifier.doi10.1117/12.2552032
dc.identifier.eisbn978-1-5106-3424-4
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42302
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage113280A
dc.source.conferenceConference on Design-Process-Technology Co-Optimization for Manufacturability XIV
dc.source.conferencedateFEB 26-27, 2020
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages6
dc.title

Sequential 3D standard cell 4T architecture using design crenellation and self-aligned MOL for N2 technology and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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