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The path to better understanding stochastics in EUV photoresist
Publication:
The path to better understanding stochastics in EUV photoresist
Date
2018
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Simone, Danilo
;
Vesters, Yannick
;
Vandenberghe, Geert
Journal
Journal of Photopolymer Science and Technology
Abstract
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1835
since deposited on 2021-10-25
407
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Acq. date: 2025-10-25
Citations
Metrics
Views
1835
since deposited on 2021-10-25
407
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations