Publication:
The path to better understanding stochastics in EUV photoresist
Date
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Vesters, Yannick | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2021-10-25T17:50:01Z | |
| dc.date.available | 2021-10-25T17:50:01Z | |
| dc.date.issued | 2018 | |
| dc.identifier.issn | 0914-9244 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/30554 | |
| dc.identifier.url | https://doi.org/10.2494/photopolymer.31.651 | |
| dc.source.beginpage | 651 | |
| dc.source.endpage | 655 | |
| dc.source.issue | 5 | |
| dc.source.journal | Journal of Photopolymer Science and Technology | |
| dc.source.volume | 31 | |
| dc.title | The path to better understanding stochastics in EUV photoresist | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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