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300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition
Publication:
300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition
Date
2023
Journal article
https://doi.org/10.1016/j.apsusc.2023.157222
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Clerix, Jan-Willem
;
Warad, L.
;
Hung, J.
;
Hody, Hubert
;
Van Roey, Frieda
;
Lorusso, Gian
;
Koret, R.
;
Lee, W. T.
;
Shah, K.
;
Delabie, Annelies
Journal
APPLIED SURFACE SCIENCE
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1248
since deposited on 2023-05-22
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Acq. date: 2025-10-25
Citations
Metrics
Views
1248
since deposited on 2023-05-22
415
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations