Publication:

300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

Date

2023
Journal article
https://doi.org/10.1016/j.apsusc.2023.157222
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dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorWarad, L.
dc.contributor.authorHung, J.
dc.contributor.authorHody, Hubert
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorLorusso, Gian
dc.contributor.authorKoret, R.
dc.contributor.authorLee, W. T.
dc.contributor.authorShah, K.
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.date.accessioned2023-07-12T20:56:39Z
dc.date.available2023-05-22T20:15:46Z
dc.date.available2023-07-12T20:56:39Z
dc.date.issued2023
dc.identifier.doi10.1016/j.apsusc.2023.157222
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41611
dc.publisherELSEVIER
dc.source.beginpageArt. 157222
dc.source.endpagena
dc.source.issueJuly
dc.source.journalAPPLIED SURFACE SCIENCE
dc.source.numberofpages10
dc.source.volume626
dc.subject.keywordsNEXT-GENERATION
dc.subject.keywordsSIZE
dc.subject.keywordsNANOPARTICLES
dc.title

300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

dc.typeJournal article
dspace.entity.typePublication
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