Publication:

Physical characterization of ultrathin high k dielectrics

Date

2003
Proceedings Paper
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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorPetry, Jasmine
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorCosnier, Vincent
dc.contributor.authorGreen, Martin
dc.contributor.authorChen, Jerry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T07:26:33Z
dc.date.available2021-10-15T07:26:33Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8321
dc.source.beginpage40
dc.source.conference8th International Symposium on Plasma-and Process-Induced Damage
dc.source.conferencedate24/04/2003
dc.source.conferencelocationParis France
dc.source.endpage50
dc.title

Physical characterization of ultrathin high k dielectrics

dc.typeProceedings paper
dspace.entity.typePublication
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