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Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor deposition
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Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor deposition
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Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Adelmann, Christoph
;
Lehnen, Peer
;
Van Elshocht, Sven
;
Zhao, Chao
;
Brijs, Bert
;
Franquet, Alexis
;
Conard, Thierry
;
Roeckerath, Martin
;
Schubert, Jurgen
;
Boissiere, Olivier
;
Lohe, Christoph
;
De Gendt, Stefan
Journal
Chemical Vapor Deposition
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1989
since deposited on 2021-10-16
Acq. date: 2026-07-26
Citations
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Views
1989
since deposited on 2021-10-16
Acq. date: 2026-07-26
Citations