Publication:

Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor deposition

Date

2007-10
Journal article
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorLehnen, Peer
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorZhao, Chao
dc.contributor.authorBrijs, Bert
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorRoeckerath, Martin
dc.contributor.authorSchubert, Jurgen
dc.contributor.authorBoissiere, Olivier
dc.contributor.authorLohe, Christoph
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T15:00:04Z
dc.date.available2021-10-16T15:00:04Z
dc.date.issued2007-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11621
dc.identifier.urlhttp://www3.interscience.wiley.com/cgi-bin/abstract/116329943/ABSTRACT
dc.source.beginpage567
dc.source.endpage573
dc.source.journalChemical Vapor Deposition
dc.source.volume13
dc.title

Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor deposition

dc.typeJournal article
dspace.entity.typePublication
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