Publication:

Line width dependent mobility in high-k – a comparative performance study between FUSI and TiN

Date

2007
Proceedings Paper
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dc.contributor.authorPantisano, Luigi
dc.contributor.authorTrojman, Lionel
dc.contributor.authorSeveri, Simone
dc.contributor.authorSan Andres Serrano, Enrique
dc.contributor.authorKerner, Christoph
dc.contributor.authorVeloso, Anabela
dc.contributor.authorFerain, Isabelle
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.date.accessioned2021-10-16T18:26:47Z
dc.date.available2021-10-16T18:26:47Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12669
dc.source.beginpage38
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA
dc.source.conferencedate23/05/2007
dc.source.conferencelocationHsin-Chu Taiwan
dc.source.endpage39
dc.title

Line width dependent mobility in high-k – a comparative performance study between FUSI and TiN

dc.typeProceedings paper
dspace.entity.typePublication
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