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From surface dependence in atomic layer deposition to area-selective deposition of TiN

Date

2019
Meeting abstract
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dc.contributor.authorDelabie, Annelies
dc.contributor.authorCarbajal, Diego
dc.contributor.authorSoethoudt, Job
dc.contributor.authorChan, BT
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorMeynaerts, Ben
dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-27T08:39:56Z
dc.date.available2021-10-27T08:39:56Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32858
dc.source.conference19th International Conference on Atomic Layer Deposition
dc.source.conferencedate21/07/2019
dc.source.conferencelocationBellevue, WA USA
dc.title

From surface dependence in atomic layer deposition to area-selective deposition of TiN

dc.typeMeeting abstract
dspace.entity.typePublication
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