Publication:

Integration of low and high temperature junction anneals for 45nm CMOS

Date

2004
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorHenson, Kirklen
dc.contributor.authorSatta, Alessandra
dc.contributor.authorSeveri, Simone
dc.contributor.authorLauwers, Anne
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorMcCoy, S.
dc.contributor.authorGelpey, J.
dc.contributor.authorPagès, Xavier
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T14:28:47Z
dc.date.available2021-10-15T14:28:47Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9206
dc.source.beginpage145
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-Based CMOS Devices II
dc.source.conferencedate9/05/2004
dc.source.conferencelocationSan Antonio, TX USA
dc.source.endpage156
dc.title

Integration of low and high temperature junction anneals for 45nm CMOS

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
9283.pdf
Size:
578.97 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions