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Conference contributions
Mask topography effect in chromeless phase lithography
Publication:
Mask topography effect in chromeless phase lithography
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Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Bekaert, Joost
;
Vandenberghe, Geert
;
Jonckheere, Rik
;
Van Den Broecke, D.
;
Socha, R.
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1941
since deposited on 2021-10-15
2
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
1941
since deposited on 2021-10-15
2
last month
Acq. date: 2025-12-10
Citations