Publication:

Mask topography effect in chromeless phase lithography

Date

2004
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Broecke, D.
dc.contributor.authorSocha, R.
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2021-10-15T15:26:06Z
dc.date.available2021-10-15T15:26:06Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9423
dc.source.beginpage669
dc.source.conference24th Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate13/09/2004
dc.source.conferencelocationMonterey, CA USA
dc.source.endpage679
dc.title

Mask topography effect in chromeless phase lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions