Publication:

Underlayer optimization method for EUV lithography

Date

2020
Proceedings Paper
https://doi.org/10.1117/12.2551684
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dc.contributor.authorVanelderen, Pieter
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorLiang, Y.C.
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorGuerrero, Douglas
dc.contributor.authorChacko, A.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorVan Driessche, Veerle
dc.contributor.imecauthorGuerrero, Douglas
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-29T06:45:23Z
dc.date.available2021-10-29T06:45:23Z
dc.date.issued2020
dc.identifier.doi10.1117/12.2551684
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36204
dc.source.beginpage1132615
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.title

Underlayer optimization method for EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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