Publication:

Very low temperature epitaxy of group-IV semiconductors for use in FinFET, stacked nanowires and monolithic 3D integration

Date

2019
Journal article
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dc.contributor.authorPorret, Clément
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorGomez Granados, Fernando
dc.contributor.authorBaudot, Sylvain
dc.contributor.authorVohra, Anurag
dc.contributor.authorKunert, Bernardette
dc.contributor.authorDouhard, Bastien
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorSchaekers, Marc
dc.contributor.authorKohen, David
dc.contributor.authorMargetis, Joe
dc.contributor.authorTolle, John
dc.contributor.authorPetersen Lima, Lucas
dc.contributor.authorSammak, Amir
dc.contributor.authorScappucci, Giordano
dc.contributor.authorRosseel, Erik
dc.contributor.authorLanger, Robert
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorBaudot, Sylvain
dc.contributor.imecauthorVohra, Anurag
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-27T16:17:12Z
dc.date.available2021-10-27T16:17:12Z
dc.date.issued2019
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33818
dc.identifier.urlhttp://jss.ecsdl.org/content/8/8/P392.full
dc.source.beginpageP392
dc.source.endpageP399
dc.source.issue8
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.volume8
dc.title

Very low temperature epitaxy of group-IV semiconductors for use in FinFET, stacked nanowires and monolithic 3D integration

dc.typeJournal article
dspace.entity.typePublication
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