Publication:
The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures
Date
| dc.contributor.author | Stuer, Cindy | |
| dc.contributor.author | Van Landuyt, J. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Rooyackers, Rita | |
| dc.contributor.author | Badenes, Gonçal | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.date.accessioned | 2021-10-14T17:55:47Z | |
| dc.date.available | 2021-10-14T17:55:47Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5689 | |
| dc.source.beginpage | 117 | |
| dc.source.endpage | 119 | |
| dc.source.issue | 1_3 | |
| dc.source.journal | Materials Science in Semiconductor Processing | |
| dc.source.volume | 4 | |
| dc.title | The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |