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The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers
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The etching behavior of tungsten (W) with respect to the orientation of the grain boundary and masking layers
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Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Hean-Cheal
;
Vanhaelemeersch, Serge
Journal
Thin Solid Films
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1968
since deposited on 2021-09-30
1
last month
Acq. date: 2025-12-13
Citations
Metrics
Views
1968
since deposited on 2021-09-30
1
last month
Acq. date: 2025-12-13
Citations